Invisible Photographer Asia | Mentorship Program call

Applications are invited for the Invisible Photographer Asia IPA Mentorship Program, a selective intensive, fee-based program conducted online. Application is open to photographers in Asia and beyond, of beginner to intermediate levels, interested in all manner and categories of photography.

Coming to its fourth year, the IPA Mentorship Program is an intensive 3-month program by Invisible Photographer Asia (IPA) for those who wish to further their personal photographic vision and goals and importantly, to strengthen their narrative conception and expression. The program, an extension of our traditional on-site photo workshops taught across cities in Asia, is conducted one-to-one and group sessions using the online platform. The aim is for mentees to conceive, continue or finish a photo project or series as a method to strengthen their photography and understand the concerns of their individual practice.

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IPA Mentorship participants have showcased their projects at Singapore International Photography Festival, Mt. Rokko International Photo Festival (Japan), Angkor Photo Festival (Cambodia), China-ASEAN Photography Festival (Nanning China), and Odessa/Batumi Photo Days (Ukraine) to name a few.

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The 2 key ingredients of the IPA Mentorship Program are Collaboration and Time. The Program seeks to create an environment of collaboration between mentors and participants where the primary focus is to discuss, incubate, critique and develop the participants’ personal photography. The Program also recognizes the value of Time – time for in-depth discussions and mentor relationships, time for participants to react and respond to feedback, and inturn develop and realise projects or personal photography goals.

Fees for the IPA Mentorship Program is USD$600.

Intake is through application and selection. Application is open to photographers in Asia and beyond, of beginner to intermediate levels, interested in all manner and categories of photography.

See website for how to apply - deadline is 28 February 2017